Voltage-margin limiting mechanisms of AlScN-based HEMTs
نویسندگان
چکیده
In this work, the off-state characteristics of AlScN/GaN high electron mobility transistors (HEMTs) grown by metalorganic chemical vapor deposition (MOCVD) were studied and directly compared to an AlGaN- AlN-HEMT in same MOCVD. Pinch-off instability leaky capacitive measurements observed for AlScN-based HEMTs, which was correlated with a higher ideality factor lower effective potential barrier height than AlGaN AlN-HEMTs. However, reverse bias exhibited sudden drain-current increase without significant gate-leakage current. The drain-leakage current is assumed be related parasitic channel across AlScN-barrier as result trap-assisted carrier transport Poole–Frenkel characteristic. demonstrated pinch-off led gain expansion load-pull early soft-breakdown, which, turn, limits achievable voltage-margin. results demonstrate key issue reveal full HEMTs mm-wave applications.
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ژورنال
عنوان ژورنال: Applied Physics Letters
سال: 2023
ISSN: ['1520-8842', '0003-6951', '1077-3118']
DOI: https://doi.org/10.1063/5.0159501